Laboratory

Office room for all members (Room 311)
lab_001

Entrance

After getting off the elevator on the third floor, please turn right and go straight ahead. The room 311 is located in the end of the corridor.

lab_002

Students and technical staffs area

All member have their own desk.
There is the desk of Dr. Makiura next to it, so that everyone can freely talk and discuss.

lab_003

Meeting space

In this place, there is a large-screen monitor. This is used for brief meetings and lab parties.

lab_004

Shared PC

This is the shared Windows PC of lab members.
This PC is installed “Materials Studio” which can perform molecular modeling, build crystal structure, and so on.
Therefore, this PC has a high quality.

lab_005

Color laser printer

This is a network printer bearing copying, scanning, and faxing functions.

 

Experimental room for fabricating and evaluating thin films (Room 313)

lab_011

Overall photo

he center lab desk, fume hood, and gas piping are set up in this room. The preparation of solution, fabrication of thin films, and optical evaluation are mainly conducted in this room.

lab_012

Fume hood

The preparation of solution, the filtration of crystals, and so on employing organic solvents are conducted.

lab_013

Gas piping

The pipes for the compressed air, vacuuming, argon, helium, oxygen, and carbon dioxide are set up.

lab_021

Two thin film fabrication devices on liquid surface

KSV minitrough system
It is also called “Langmuir-Blodgett (LB) film fabrication system”.
A PTFE Langmuir trough (shallow container) is filled with liquid as a subphase. The molecule is spread onto the subphase, and the thin film is fabricated on liquid surface.
Two barriers which are set up at right and left of the Langmuir tough are moved, and the forming state of thin film is investigated by measuring the surface pressure.
The prepared thin film is deposited onto the substrate by the horizontal dipping method.
The movement of barriers and dipper is controlled by PC.
There are two systems bearing same specifications.

lab_022

Brewster angle microscope

KSV NIMA MicroBAM
The formation of thin film on liquid surface is observed by utilizing reflection phenomenon of light. This microscope with the thin film fabrication system makes automatic shooting and video recording possible.
“What is BAM (Brewster Angle Microscope)?”  ic_out

lab_023

UV-vis-IR absorption spectra measurement device

JASCO V-670 spectrophotometer
The absorption spectra is measured by irradiating UV-vis-IR light (measurement wavelength range: 190‒2700 nm).
The measurement of not only solution but also thin film is possible. The diffuse reflectance spectra of powder and colloid solution can be also measured by employing an integrating sphere.

lab_024

IR absorption spectra measurement device

JASCO FT-IR 6200 spectrometer
The absorption spectra is measured by irradiating IR light (measurement wavenumber range: 7800‒350 cm-1).
The sample chamber is vacuumed and displaced by inert gas, which eliminates the effect of water and CO2 in the atmosphere. By the transmission method, the measurement of sample powder diluted with KBr (In our lab, there is a KBr plate set which can prepare KBr samples briefly) and thin films.
Moreover, by the ATR method, the special measurement of microscale sample and sample surface is also possible.
As the prism for ATR, germanium and diamond are prepared.
In the transmission and ATR methods, this system is fixed so that the place of sample is kept sealed.
Thus, the active sample can be measured by preparing in the glove box.
In addition, by the RAS (Reflection-, Absorption Spectroscopy) method, the absorption spectra of super-thin film prepared on the substrate including gold can be measured, too.

lab_025

Fluorescence spectra measurement device

HORIBA SPEC Fluorolog-3
The sample is irradiated by the excited light whose source is 450 W xenon lamp, and the dispersion of the obtained fluorescence affords spectra.
The double grating spectroscope is set up at the both sides of excited light and fluorescence, which removes the stray light.
Thus, spectra can be measured sensitively.
The detecting correspondence wavelength range of the fluorescence side is from 240 to 850 nm. By employing the dedicated cryostat and temperature controller, the measurement at a temperature of liquid nitrogen is possible.

lab_031

Pseudo sunlight irradiation device (solar simulator)

BUNKOUKEIKI OTENTO-SUN III
This device achieves the pseudo sunlight by employing xenon lamp and AM 1.5G filter.
Irradiation to solar cells et al. makes the characteristic evaluation possible.
Moreover, this device is AAA type solar simulator according to JIS C8912 and C8933, and the characteristic evaluation of solar cells according to universal standard is possible by using high-accuracy I-V measurement system.

lab_032

Spectral sensitivity measurement device (Action spectra measurement device)

BUNKOUKEIKI SM-250 hyper monolight system
The current value of sample is measured based on the amount of irradiation light at each wavelength, and the spectral sensitivity of photoelectric conversion element including solar is investigated (wavelength range: 300‒1150 nm).

lab_033

High-precision gas/vapor adsorption amount measurement device

MicrotracBEL BELSORP-max
The specific surface area and micropore distribution are investigated by adsorbing gas and vapour into the sample and measuring the amount of adsorption.
The simultaneous measurement of three samples in case of the simple mode and two samples in case of high-precision is possible, respectively.
The heater which can heat up to 450°c is attached, thus the adsorption measurement without taking out the sample is possible by pretreating in the device body. This is why the high-precision measurement of the adsorption amount at low pressure region is possible.

lab_034

Pretreatment device for adsorption measurement

MicrotracBEL BELPREP-vacII
This is the vacuum heating pretreatment device for the measurement of gas/vapor adsorption amount.
The pretreatment of three samples can be conducted simultaneously.
The max heating temperature is 430°c.

lab_034

Nanosensing adsorption measurement system

MicrotracBEL BELQCM
Vapour sorption of a film fabricated on a quartz crystal substrate can be measured by a quartz crystal micro balanece method.
6 samples are analysed simultaneously.

lab_034

Auto gas circulation glove box

MIWA DBO-1KP-OFUMU
We treat air sensitive sample in the glove box in which dried Ar is replaced.
Two gloves, an organic solvent trap and a heat functioned side box are installed.
In addition, a precision balance and a press tableting machine are planed in the box.

lab_034

Impedance/Gain-Phase Analyzer

solartron 1260
Impedance of various materials we research such as organic-inorganic hybrid materials, nanomaterials and porous materials is measured.
Temperature dependence of the impedance can be automatically analysed with a cryostat and a temperature controller (LakeShore 335).

lab_041

Constant temperature Oven

Yamato Scientific Co., Ltd. Forced convection ovens of standard type DKN302
This is the forced convection oven which keep the temperature constant in the oven.
This oven is mainly used for hydrothermal synthesis of crystals. (temperature region: from rt to 260°c)

lab_042

Vacuum dryer

AVO-200NS-D
The inside of dryer is kept constant temperature and vacuumed, and the sample is dried. (temperature region: from rt to 220°c))

lab_043

Electric furnace

FULL-TECH FT-101FMW
This furnace is employed for the synthesis of ceramic and burning of titanium dioxide film which require high-temperature treatment (temperature region: from rt to 1200°c).
The rapid heating, which rise a temperature until 1000°c for 15 minutes, is possible.
The atmosphere in the oven can be also controlled by employing nitrogen, oxygen, argon, and so on through temperature control program and flow valve.

lab_044

Precision weighing machine

The max measurable masses are 101 g in case of 0.01 mg scale range and 250 g in case of 0.1 mg scale range, respectively.

lab_045

Ultrasonic bath

This is the ultrasonic bath which can control temperature and time.

 

Clean room (Build C10, 2nd floor)

lab_042

Resistance heating vacuum deposition system

Design and Technology, RMDO-01
Thin films of metals and organic compounds are fabricated by vacuum deposition.
Two evaporation sources can be set in the chamber. The chamber door is front-open style.
We can easily change the substrates and the evaporations sources.

blank

Surface plasma treatment system

FEMTO SCIENCE CUTE-MP
ubstrate surface is treated with plasma.

blank

Spin-coater

MIKASA MS-A100
Thin films of organic polymers are spin coated on solid substrates.

 

Shared equipment of NanoSquare Research Institute

Various shared equipments are prepared in the same building (C10 building).
https://www.nanosq.21c.osakafu-u.ac.jp/ttsl/en/en/ ic_out